Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography.
Influence of barrier interlayers on the performance of Mo/Be multilayer mirrors for next-generation EUV lithography.
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DOI：
10.1364/oe.26.033718
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发表时间：
2018-12
期刊：
影响因子：
3.8
通讯作者：
M. Svechnikov;N. Chkhalo;S. A. Gusev;A. N. Nechay;D. E. Pariev;A. Pestov;V. Polkovnikov;D. Tatarskiy;N. Salashchenko;F. Schäfers;M. Sertsu;A. Sokolov;Y. Vainer;M. Zorina
中科院分区：
文献类型：
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作者：
M. Svechnikov;N. Chkhalo;S. A. Gusev;A. N. Nechay;D. E. Pariev;A. Pestov;V. Polkovnikov;D. Tatarskiy;N. Salashchenko;F. Schäfers;M. Sertsu;A. Sokolov;Y. Vainer;M. Zorina
对纯Mo/Be结构和三种Mo/Be基B4C、C和Si夹层结构的11.2nm极紫外光刻多层膜反射镜的结构和反射性能进行了比较研究。结果表明，Mo/Be反射镜在正入射时反射率最大，而Mo/Be/Si反射镜结构最完善。在结构中引入B4C和C层增加了层间粗糙度并降低了界面的锐度，对目标涂层特性产生不利影响。研究结果采用四种技术：X射线反射计，小角X射线散射，原子力显微镜，透射电子显微镜。
A comparative study was carried out of the structure and reflection performance of four types of multilayer mirror for extreme ultraviolet lithography at 11.2 nm; these were a pure Mo/Be structure and three Mo/Be-based structures with thin B4C, C and Si interlayers. It was demonstrated that Mo/Be mirrors show maximum reflectance at normal incidence, while maximum structural perfection is shown by Mo/Be/Si mirrors. The introduction of B4C and C layers into the structure increases the interlayer roughness and reduces the sharpness of the interfaces, adversely affecting the target coating characteristics. Results are presented for studies using four techniques: X-ray reflectometry, small-angle X-ray scattering, atomic force microscopy, and transmission electron microscopy.