Direct growth of high-quality thick CdTe epilayers on Si (211) substrates by metalorganic vapor phase epitaxy for nuclear radiation detection and imaging

Direct growth of high-quality thick CdTe epilayers on Si (211) substrates by metalorganic vapor phase epitaxy for nuclear radiation detection and imaging
复制标题

DOI:
10.1007/s11664-006-0251-5
复制
发表时间:
2006-06
影响因子:
2.1
通讯作者:
M. Niraula;K. Yasuda;H. Ohnishi;H. Takahashi;K. Eguchi;K. Noda;Y. Agata
M. Niraula;K. Yasuda;H. Ohnishi;H. Takahashi;K. Eguchi;K. Noda;Y. Agata
中科院分区:
工程技术4区
文献类型:
--
作者:
M. Niraula;K. Yasuda;H. Ohnishi;H. Takahashi;K. Eguchi;K. Noda;Y. Agata

文献摘要

被引文献

相似文献