Dynamics of Radical Cation of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Extreme-Ultraviolet and Electron Beam Lithographies

Dynamics of Radical Cation of Poly(4-hydroxystyrene)-Based Chemically Amplified Resists for Extreme-Ultraviolet and Electron Beam Lithographies
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用于极紫外和电子束光刻的聚(4-羟基苯乙烯)基化学放大抗蚀剂的自由基阳离子动力学

DOI:
10.1143/jjap.49.106501
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发表时间:
2010
期刊:
Jpn. J. Appl. Phys.
影响因子:
--
通讯作者:
and S. Tagawa
and S. Tagawa
中科院分区:
--
文献类型:
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作者:
K. Okamoto;M. Tanaka;T. Kozawa;and S. Tagawa

文献摘要

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阐明电离辐射辐照后抗蚀剂聚合物的反应机理是极紫外和电子束化学放大抗蚀剂的重要问题。聚合物中自由基阳离子的动力学对于阐明抗蚀剂中酸形成(去质子化)的机理是必不可少的。用脉冲辐解法研究了聚4-甲氧基苯乙烯(PMOS)在1,2-二氯乙烷和对二氧六环溶液中的瞬态吸收。在近红外区,观察到一个特征电荷共振带,它代表了分子内PMOS二聚体阳离子自由基[(Ph-OCH 3)2+·]的两个苯环之间的π-π相互作用.在卤代烃分子作为电子清除剂存在下,(Ph-OCH 3)2+·的产率因形成离子/电荷转移络合物而提高.用密度泛函理论(DFT)计算了(Ph-OCH 3)2+·的电子态.
The elucidation of the reaction mechanism after the irradiation of ionizing radiation onto resist polymers is an important issue for extreme-ultraviolet and electron beam chemically amplified resist. The dynamics of radical cations of polymers is essential for elucidating the mechanism of acid formation (deprotonation) in resists. The transient absorption of poly (4-methoxystyrene)(PMOS) was observed in 1, 2-dichloroethane and p-dioxane solutions by pulse radiolysis. In the near-infrared region, a characteristic charge resonance band, which represents the π–π interaction between the two benzene rings of the intramolecular PMOS dimer radical cation [(Ph–OCH 3) 2+·], was observed. In the presence of halogenated hydrocarbon molecules acting as electron scavengers, the yield of (Ph–OCH 3) 2+· was enhanced by the formation of an ion/charge transfer complex. Density functional theory (DFT) calculations were also performed to investigate the electronic state of (Ph–OCH 3) 2+·.