CVD Growth of Porous Graphene Foam in Film Form
CVD Growth of Porous Graphene Foam in Film Form
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DOI：
10.1016/j.matt.2020.06.012
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发表时间：
2020-08-05
期刊：
影响因子：
18.9
通讯作者：
Ruoff, Rodney S.
中科院分区：
文献类型：
--
作者：
Huang, Ming;Wang, Chunhui;Ruoff, Rodney S.
通过在铜箔上电镀镍制备了多孔铜/镍箔，并将其作为模板用于化学气相沉积生长多孔石墨烯泡沫。石墨烯泡沫中的壁厚为两到五层石墨烯，相互连接形成一个低密度的多孔网络，孔径分布广泛，导电性高。与以前研究的电磁干扰屏蔽材料的综合比较表明，该石墨烯泡沫是最好的电磁干扰屏蔽材料之一，其比电磁干扰屏蔽效能(>；720dBcm3g(-1))和绝对效能(>；45000dBcm2g(-)1)均优于大多数其他材料。这种石墨烯泡沫对各种有机溶剂和油具有很大的吸收能力，并在几秒钟内将其吸附。合成策略应为各种应用提供生成其他3D多孔结构的一般方法，包括基于各种已知2D材料的3D多孔结构。
Porous Cu/Ni foils were made by electroplating Ni on Cu foils and used as templates for chemical vapor deposition growth of porous graphene foam. The walls in the graphene foam were found to be two to five graphene layers thick, interconnected to form a low-density porous network with a wide distribution of pore sizes and a high electrical conductivity. A comprehensive comparison with previously studied materials for electromagnetic interference (EMI) shielding showed that this graphene foam is among the best EMI shielding materials; its specific EMI shielding effectiveness (>720 dB cm 3 g(-1)) and absolute effectiveness (>45,000 dB cm(2) g(-)1) are superior to those of most other materials. This graphene foam has a large absorption capacity for various organic solvents and oils and adsorbs them within seconds. The synthesis strategy should provide a general approach for generating other 3D porous structures, including those based on a variety of known 2D materials, for various applications.