High-resolution X-ray diffraction analysis on HVPE-grown thick GaN layers
High-resolution X-ray diffraction analysis on HVPE-grown thick GaN layers
复制标题
HVPE 生长的厚 GaN 层的高分辨率 X 射线衍射分析
DOI:
10.1016/j.jcrysgro.2009.01.050
复制
发表时间:
2009-05-01
影响因子:
1.8
通讯作者:
Yang, H.
中科院分区:
文献类型:
--
作者:
Liu, J. Q.;Wang, J. F.;Yang, H.
The threading dislocation density of hydride vapor phase epitaxy (HVPE)-grown thick GaN layers was measured by high-resolution X-ray diffraction (HR-XRD). Three models were compared, namely mosaic model, Kaganer model and modified Kaganer model. X-ray rocking curves (XRC) of (0 0 0 2), (1 0 (1) over bar 5), (1 0 (1) over bar 4), (1 0 (1) over bar 3),(1 0 (1) over bar 2), (1 0 (1) over bar 1) and (1 0 (1) over bar 0) planes were recorded for quantitative analysis. The screw-, edge-, and mixed-type threading dislocation densities were simulated from the XRD line profile by using the three models. The dislocation density was also measured by atomic force microscopy (AFM), wet chemical etching and cathodoluminescence (CL). The results showed that the Kaganer model was more physically precise and well explained the rocking curve broadening for HVPE-grown high-quality GaN compared with the mosaic model. Assuming a randomly distributed threading dislocation configuration, we modified the Kaganer model. Based on the modified Kaganer model, the edge and screw threading dislocation densities in HVPE-grown GaN thick films ranging from 20 Pm up to 700 mu m were analyzed. It was shown that screw-type dislocation density decreased more rapidly than edge-type dislocation with increase in film thickness. (C) 2009 Elsevier B.V. All rights reserved.