Reactivity screening of silica
Reactivity screening of silica
复制标题
二氧化硅的反应性筛选
DOI:
10.1016/j.apsusc.2006.10.058
复制
发表时间:
2007
影响因子:
6.7
通讯作者:
U. Burghaus
中科院分区:
文献类型:
--
作者:
S. Funk;T. Nurkic;U. Burghaus
As a screening of the chemical activity of silica [SiO2/Si(100)], which is one of the most often used supports for nanostructures, thermal desorption spectroscopy data have been gathered for a variety of gases such as n-nonane, n-hexane, n-butane, iso-butane, ethane, CO2, CO, O2, and H/H2. Whereas, the alkanes with chain lengths larger than three adsorb with large binding energies (Ed=50–70kJ/mol), the activity towards the other probe molecules is negligible (<24kJ/mol) down to adsorption temperatures of 95K. The adsorption of n- and iso-butane has additionally been studied by molecular beam scattering and follows standard precursor mediated adsorption dynamics.