Single-exposure maskless plasmonic lithography for patterning of periodic nanoscale grating features
Single-exposure maskless plasmonic lithography for patterning of periodic nanoscale grating features
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DOI：
10.1117/1.3386680
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发表时间：
2010-04
影响因子：
2
通讯作者：
K. V. Sreekanth;V. M. Murukeshan
中科院分区：
文献类型：
--
作者：
K. V. Sreekanth;V. M. Murukeshan
从实验和数值两个方面论证了一种基于表面等离子激元(SP)干涉的一维(1-D)纳米级光栅图形的光刻技术。我们报道了一种具有成本效益的、单次曝光的无掩模等离子体光刻技术，可以在364 nm的曝光波长下产生156 nm的周期性光栅线。
A lithography technique for patterning one-dimensional (1-D) nanoscale grating features based on surface plasmon (SP) interference is demonstrated both experimentally and numerically. We report a cost-effective, single-exposure maskless plasmonic lithography to generate 156-nm periodic grating lines at an exposure wavelength of 364 nm.