Size control of InAs quantum dashes

Size control of InAs quantum dashes
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InAs 量子冲刺的尺寸控制

DOI:
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发表时间:
2005
期刊:
影响因子:
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通讯作者:
A. Forchel
A. Forchel
中科院分区:
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文献类型:
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作者:
A. Sauerwald;T. Kümmell;G. Bacher;A. Somers;R. Schwertberger;J. Reithmaier;A. Forchel

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用化学敏感扫描透射电镜研究了在In0.53Ga0.23Al0.24As∕InP上生长的自组织InAs量子线。由纯InAs组成的量子破折号呈现出三角形截面。最重要的是,量子划线尺寸线性依赖于标称InAs层厚度,并且可以在不改变高度/宽度比的情况下以3倍的倍数变化。因此,在不改变量子线形状和组成的情况下,通过调整单个生长参数,可以将发射波长控制在1.37 ~ 1.9μm之间。
Self-organized InAs quantum dashes grown on In0.53Ga0.23Al0.24As∕InP have been investigated by chemically sensitive scanning transmission electron microscopy. The quantum dashes, which consist of pure InAs, exhibit a triangular cross section. Most important, the quantum dash size depends linearly on the nominal InAs layer thickness and can be varied by a factor of 3 without changing the height∕width ratio. Thus, the emission wavelength can be controlled between 1.37 and 1.9μm without modifying shape and composition of the quantum dashes by adjusting a single growth parameter.