Epitaxial growth of stacked β-FeSi2 nanodots on Si substrates and their thermoelectric properties

Epitaxial growth of stacked β-FeSi2 nanodots on Si substrates and their thermoelectric properties
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Si衬底上堆叠β-FeSi2纳米点的外延生长及其热电性能

DOI:
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发表时间:
2013
期刊:
影响因子:
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通讯作者:
S. Takeuchi and A. Sakai
S. Takeuchi and A. Sakai
中科院分区:
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文献类型:
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作者:
M. Isogawa;Y. Nakamura;J. Kikkawa;S. Takeuchi and A. Sakai

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