Y.Gotoh, H.Tsuji, J.Ishikawa: "Application of compact microwave ion source to low temperature growth of transition-metal nitride thin films for vacuum microelectronics"Review of Scientific Instruments. Vol.71, No.2. 1002-1005 (2000)
Y.Gotoh, H.Tsuji, J.Ishikawa: "Application of compact microwave ion source to low temperature growth of transition-metal nitride thin films for vacuum microelectronics"Review of Scientific Instruments. Vol.71, No.2. 1002-1005 (2000)
复制标题
Y.Gotoh、H.Tsuji、J.Ishikawa:“紧凑型微波离子源在真空微电子过渡金属氮化物薄膜低温生长中的应用”科学仪器评论。
DOI:
--
复制
发表时间:
--
期刊:
影响因子:
--
通讯作者:
中科院分区:
文献类型:
--
作者: