Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge
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DOI：
10.1116/1.582380
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发表时间：
2000-07-01
期刊：
影响因子：
--
通讯作者：
Petrov, I
中科院分区：
文献类型：
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作者：
Mac치k, K;Kouznetsov, V;Petrov, I
介绍了一种新型高功率密度脉冲等离子体放电的时间分辨等离子体探针测量方法。脉冲中的极端峰值功率密度（约为几kW cm-2）导致非常致密的等离子体，在源到衬底的距离为几cm和压力为0.13 Pa（1 mTTorr）时，衬底离子通量密度高达1 A cm-2。脉冲持续时间类似于100 μ s，脉冲重复频率为50 Hz。等离子体由金属和惰性气体离子，从时间分辨的朗缪尔探针测量和原位光发射光谱数据确定。有人发现，在脉冲开始时的等离子体成分占主导地位的Ar离子。随着时间的推移，金属离子被检测到，并最终占主导地位的离子组成。的离子通量的时间发展的过程参数的效果进行了讨论。溅射金属流的电离部分在离源6 cm处的平均速度为2500 m·s（-1），符合碰撞级联溅射理论。通过比较沉积原子的总通量与脉冲中金属离子的测量电荷，发现在0.13 Pa的压力下溅射金属通量的电离度为40%+/-20%。(C)2000年美国真空学会。[S0734-2101（00）03404-7]。
Time resolved plasma probe measurements of a novel high power density pulsed plasma discharge are presented. Extreme peak power densities in the pulse ton the order of several kW cm(-2)) result in a very dense plasma with substrate ionic flux densities of up to 1 A cm-2 at source-to-substrate distances of several cm and at a pressure of 0.13 Pa (1 mTTorr). The pulse duration was similar to 100 mu s with a pulse repetition frequency of 50 Hz. The plasma consists of metallic and inert gas ions, as determined from time resolved Langmuir probe measurements and in situ optical emission spectroscopy data. It was found that the plasma composition at the beginning of the pulse was dominated by Ar ions. As time elapsed metal ions were detected and finally dominated the ion composition. The effect of the process parameters on the temporal development of the ionic fluxes is discussed. The ionized portion of the sputtered metal flux was found to have an average velocity of 2500 m s(-1) at 6 cm distance from the source, which conforms to the collisional cascade sputtering theory. The degree of ionization of the sputtered metal flux at a pressure of 0.13 Pa was found to be 40%+/-20% by comparing the total flux of deposited atoms with the charge measured for the metal ions in the pulse. (C) 2000 American Vacuum Society. [S0734-2101(00)03404-7].