Novel photo-cross-linkable dendrimers having thermal de-cross-linking properties

Novel photo-cross-linkable dendrimers having thermal de-cross-linking properties
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DOI:
10.1016/j.polymer.2010.09.010
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发表时间:
2010-10
期刊:
影响因子:
4.6
通讯作者:
Haruyuki Okamura;M. Shirai
Haruyuki Okamura;M. Shirai
中科院分区:
化学2区
文献类型:
--
作者:
Haruyuki Okamura;M. Shirai

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采用聚合法合成了具有光交联和热脱交联性能的新型聚芳醚类树枝状大分子。新合成了一种用于合成树枝状大分子的保护的A2 B单体1-烯丙氧基-3,5-双(溴甲基)苯。烯丙基的钯催化脱保护以高产率进行。含有光酸产生剂(PAG)的树枝状聚合物的膜在照射时变得不溶于溶剂。在120-200°C下烘烤后,经辐照的膜变得可溶于溶剂中。的不溶解和再溶解的配置文件受到强烈的影响,照射和烘烤条件和生成的树枝状大分子。通过TGA和DTA分析以及FT-IR光谱研究了反应途径。
Novel poly(aryl ether) type dendrimers having photo-cross-linking and thermal de-cross-linking properties were synthesized by a convergent method. A protected A2B monomer, 1-allyloxy-3,5-bis(bromomethyl)benzene, was newly prepared for the dendrimer synthesis. Palladium-catalyzed deprotection of an allyl group proceeded in high yields. The films of dendrimers containing a photoacid generator (PAG) became insoluble in solvents on irradiation. The irradiated films became soluble in solvents after baking at 120–200°C. The insolubilization and redissolution profiles were strongly affected by irradiation and baking conditions and the generation of the dendrimers. A reaction pathway was studied by TGA and DTA analysis and FT-IR spectroscopy.