Exploration of the ultimate patterning potential achievable with focused ion beams.
Exploration of the ultimate patterning potential achievable with focused ion beams.
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探索聚焦离子束可实现的最终图案化潜力。
DOI：
10.1016/j.ultramic.2008.09.007
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发表时间：
2005
期刊：
影响因子：
2.2
通讯作者：
L. Auvray
中科院分区：
文献类型：
--
作者：
J. Giérak;E. Bourhis;G. Faini;G. Patriarche;A. Madouri;R. Jede;L. Bruchhaus;S. Bauerdick;B. Schiedt;A. Biance;L. Auvray
纳米科学和纳米技术领域的决定性进展与新仪器以及相关写作计划和方法的开发密切相关。因此，我们最近提出了利用高度聚焦离子束作为工具的纳米结构潜力，以克服当前纳米制造技术的固有限制，并允许在许多纳米科学挑战中迫切需要的创新图案化方案。在这项工作中，我们将首先详细介绍一个非常高的分辨率FIB仪器，我们已经专门开发，以满足这些纳米制造的要求。然后，我们将介绍和说明一些先进的FIB处理方案。这些图案化方案是（i）作为FIB纳米加工的理想模板的超薄膜。(ii)磁性薄膜直接图案化之局部缺陷注入。(iii)石墨衬底的功能化以制备2D有序的簇阵列。(iv)微腔光学特性的FIB工程。
Decisive advances in the fields of nanosciences and nanotechnologies are intimately related to the development of new instruments and of related writing schemes and methodologies. Therefore we have recently proposed exploitation of the nano-structuring potential of a highly Focused Ion Beam as a tool, to overcome intrinsic limitations of current nano-fabrication techniques and to allow innovative patterning schemes urgently needed in many nanoscience challenges. In this work, we will first detail a very high resolution FIB instrument we have developed specifically to meet these nano-fabrication requirements. Then we will introduce and illustrate some advanced FIB processing schemes. These patterning schemes are (i) Ultra thin membranes as an ideal template for FIB nanoprocessing. (ii) Local defect injection for magnetic thin film direct patterning. (iii) Functionalization of graphite substrates to prepare 2D-organized arrays of clusters. (iv) FIB engineering of the optical properties of microcavities.