Characterization of (Ti, AI)N films prepared by ion mixing and vapor deposition
Characterization of (Ti, AI)N films prepared by ion mixing and vapor deposition
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DOI：
10.1016/j.msea.2004.03.096
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发表时间：
2004-12-15
期刊：
影响因子：
6.4
通讯作者：
Ueta, T
中科院分区：
文献类型：
--
作者：
Uchida, H;Yamashita, M;Ueta, T
采用离子混合气相沉积（IVD）技术，在N离子同时照射下沉积Ti和Al金属气相，制备了钛铝氮化（Ti, Al）N薄膜。随着蒸发Al/Ti和/或输运比(Ti + Al)/N的增加，膜中的单相NaCl结构通过NaCl和纤锌矿结构组成的两相混合物转变为纤锌矿结构。因此，在揭示两相结构的基础上，确定了耐磨损、耐腐蚀硬质涂层的最佳制备条件。（Ti, Al）N薄膜也具有较高的抗氧化性。因此，结果表明，在高温氧化试验中，在（Ti， AI）N薄膜顶部形成的氧化铝层保护薄膜免受进一步氧化。(C) 2004 Elsevier B.V.版权所有
Titanium aluminum nitride (Ti, Al)N films were prepared by depositing Ti and Al metal vapor under simultaneous irradiation of N ions, that is ion mixing and vapor deposition (IVD) technique. With an increase of evaporation Al/Ti and/or transport ratio (Ti + Al)/N, a single-phase of NaCl structure in the films transformed into that of wurtzite structure through a two-phase mixture consisting of NaCl and wurtzite structure. Based on the revelation of two-phase structure, therefore, the optimum preparation conditions for wear- and corrosion-resistive hard coating were identified. The (Ti, Al)N films were also highly resistant against oxidation. Consequently, the results suggest that the Al oxide layers formed on the top of (Ti, AI)N films during elevated temperature oxidation tests protect the films from further oxidation. (C) 2004 Elsevier B.V. All rights reserved.