Dielectric charging in silicon nitride films for MEMS capacitive switches: Effect of film thickness and deposition conditions
Dielectric charging in silicon nitride films for MEMS capacitive switches: Effect of film thickness and deposition conditions
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DOI：
10.1016/j.microrel.2009.07.006
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发表时间：
2009-09
期刊：
影响因子：
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通讯作者：
U. Zaghloul;G. Papaioannou;F. Coccetti;P. Pons;R. Plana
中科院分区：
文献类型：
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作者：
U. Zaghloul;G. Papaioannou;F. Coccetti;P. Pons;R. Plana
