Improved Density and Mechanical Properties of a Porous Metal-Free Phthalocyanine Thin Film Isotropically Pressed with Pressure Exceeding the Yield Strength
Improved Density and Mechanical Properties of a Porous Metal-Free Phthalocyanine Thin Film Isotropically Pressed with Pressure Exceeding the Yield Strength
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DOI：
10.1143/apex.4.111603
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发表时间：
2011-11
影响因子：
2.3
通讯作者：
M. Kanari;T. Wakamatsu;Randy Gui Guan Fatt;I. Ihara
中科院分区：
文献类型：
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作者：
M. Kanari;T. Wakamatsu;Randy Gui Guan Fatt;I. Ihara
采用真空蒸发法在基片上镀制了无金属的酞菁薄膜，并研究了冷等静压的影响。冷等静压薄膜的厚度和凸面高度分别减少了40%和50%。还原速率之间的近似一致表明，气孔主要存在于薄膜内部，但沿薄膜-衬底边界存在，薄膜密度随冷等静压工艺的提高而提高。冷等静压薄膜的压痕模数、硬度和弯曲强度分别提高了2.3和2.8倍和26%。
Metal-free phthalocyanine films were coated on substrates through vacuum evaporation, and the effects of applying a cold isostatic press were investigated. The thickness and convex surface height of cold isostatic pressed films decreased by 40 and 50%, respectively. Approximate agreement between the reduction rates indicates that pores exist mainly inside the as-coated films but along the film–substrate boundary and that film density improves with the cold isostatic pressing. The indentation modulus, hardness, and bending strength of the cold isostatic pressed films improved by factors of 2.3 and 2.8 and by 26%, respectively.