Low temperature plasmas

Low temperature plasmas
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低温等离子体

DOI:
10.1088/0143-0807/12/1/008
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发表时间:
1991
影响因子:
0.7
通讯作者:
H. Hess
H. Hess
中科院分区:
物理与天体物理4区
文献类型:
--
作者:
H. Gundel;E. Hantzsche;H. Hess

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在过去的几年里,低温等离子体的物理学变得越来越重要,特别是因为它们的各种技术应用。低温等离子体除了用于照明的气体放电灯外,还广泛应用于微电子等先进技术中。高新技术的应用促进了该领域应用研究和基础研究的进一步发展。在描述了低温等离子体的主要特性后,给出了一种理论方法。从等离子体作为多粒子系统的一般动力学理论出发,表明通过几种平均方法可以找到适当的宏观描述。在引入速率方程和解释弛豫过程之后,定义了所谓的局部热力学平衡,并给出了局部热力学平衡等离子体的描述。特别注意非理想性的影响,例如等离子体相变。由于等离子体辐射在应用和等离子体诊断中的实际重要性,我们将单独讨论等离子体辐射。在对等离子体-壁相互作用的物理学作了简短的介绍之后,对几种类型的气体放电作了简要的描述。最后,综述了低温等离子体的主要应用。
During the last years the physics of low temperature plasmas has grown in importance, especially because of their various technological applications. Besides their well known employment in gas discharge lamps for light production, low temperature plasmas are widely used in advanced technologies such as, e.g., in microelectronics. High-technology applications promote the further development of applied and basic research in this field. After describing the main properties of low temperature plasmas a theoretical approach is given. Starting from the general kinetic theory of a plasma as a many-particle system it is shown that by means of several averaging procedures an appropriate macroscopic description can be found. After introducing the rate equations and explaining the relaxation processes the so called local thermodynamic equilibrium (LTE) is defined and a thermodynamic description of LTE plasmas is presented. Special attention is paid to the effects of nonideality, e.g. the plasma phase transitions. Because of its practical importance in applications and for plasma diagnostics a separate section deals with plasma radiation. After giving a short introduction to the physics of plasma-wall interaction several types of gas discharges are briefly described. Finally, the most important applications of low temperature plasmas are reviewed.
Setsuo Ichimaru:物理报告。
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