Recognition of the Atomic Terminating Layer in Perovskite Oxide Substrates by Reflection High Energy Electron Diffraction
Recognition of the Atomic Terminating Layer in Perovskite Oxide Substrates by Reflection High Energy Electron Diffraction
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反射高能电子衍射识别钙钛矿氧化物基底中的原子终止层
DOI：
10.1143/jjap.42.l389
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发表时间：
2003
影响因子：
1.5
通讯作者：
H. Koinuma
中科院分区：
文献类型：
--
作者：
R. Takahashi;Y. Matsumoto;H. Koinuma
通过监测钙钛矿基底上MO（M=Sr，Ba）薄膜初始生长过程中反射高能电子衍射图案的振荡强度，可以识别钙钛矿氧化物的化学表面结构。这种成功的分析技术已在 A 和 B 位氧化物封端的 ABO3 基板上的薄膜生长得到验证。 MO薄膜的外延生长主要由生长晶格和下面的原子层之间的化学相互作用决定，以遵循形成更稳定的层晶胞的晶体习性。这种简单的技术可以用作相关物理技术的替代品，例如目前用于确定终止层的同轴碰撞碰撞离子散射光谱和摩擦力显微镜。
The chemical surface structure in perovskite oxides has been identified by monitoring the oscillation intensity of reflection high energy electron diffraction patterns during initial growth of MO (M=Sr, Ba) films on the perovskite substrate. This successful analysis technique is demonstrated for the film growth on A and B-site oxides terminated ABO3 substrates. Epitaxial growth of MO thin films is dominated by chemical interaction between the growing lattice and the underlying atomic layer to follow the crystal habit of forming a more stable layer unit cell. This simple technique can be used as a substitute to relevant physical techniques such as coaxial impact-collision ion scattering spectroscopy and friction force microscopy that are currently used techniques to determine the termination layer.