Advances in understanding of high-Z material erosion and re-deposition in low-Z wall environment in DIII-D
Advances in understanding of high-Z material erosion and re-deposition in low-Z wall environment in DIII-D
复制标题
DIII-D 低 Z 壁环境中高 Z 材料侵蚀和再沉积的认识进展
DOI：
10.1088/1741-4326/aa6451
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发表时间：
2017-03
期刊：
影响因子：
3.3
通讯作者：
E.A
中科院分区：
文献类型：
--
作者：
R. Ding;D.L. Rudakov;P.C. Stangeby;W.R. Wampler;T. Abrams;S. Brezinsek;A. Briesemeister;I. Bykov;V.S. Chan;C.P. Chrobak;J.D. Elder;H.Y. Guo;J. Guterl;A. Kirschner;C.J. Lasnier;A.W. Leonard;M.A. Makowski;A.G. McLean;P.B. Snyder;D.M. Thomas;D. Tskhakaya;E.A
Dedicated DIII-D experiments coupled with modeling reveal that the net erosion rate of high-Z materials, i.e. Mo and W, is strongly affected by carbon concentration in the plasma and the magnetic pre-sheath properties. Different methods such as electrical biasing and local gas injection have been investigated to control high-Z material erosion. The net erosion rate of high-Z materials is significantly reduced due to the high local re-deposition ratio. The ERO modeling shows that the local re-deposition ratio is mainly controlled by the electric field and plasma density within the magnetic pre-sheath. The net erosion can be significantly suppressed by reducing the sheath potential drop. A high carbon impurity concentration in the background plasma is also found to reduce the net erosion rate of high-Z materials. Both DIII-D experiments and modeling show that local 13CH4 injection can create a carbon coating on the metal surface. The profile of 13C deposition provides quantitative information on radial transport due to E × B drift and the cross-field diffusion. The deuterium gas injection upstream of the W sample can reduce W net erosion rate by plasma perturbation. In H-mode plasmas, the measured inter-ELM W erosion rates at different radial locations are well reproduced by ERO modeling taking into account charge-state-resolved carbon ion flux in the background plasma calculated using the OEDGE code.
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影响因子：
3.1
作者：
W. Wampler;P. Stangeby;J. Watkins;D. Buchenauer;D. Rudakov;C. Wong
通讯作者：
W. Wampler;P. Stangeby;J. Watkins;D. Buchenauer;D. Rudakov;C. Wong
影响因子：
3.3
作者：
N. den Harder;S. Brezinsek;T. Pütterich;N. Fedorczak;G. Matthews;A. Meigs;M. Stamp;M. V. D. van de Sanden;G. V. van Rooij
通讯作者：
N. den Harder;S. Brezinsek;T. Pütterich;N. Fedorczak;G. Matthews;A. Meigs;M. Stamp;M. V. D. van de Sanden;G. V. van Rooij
影响因子：
3.1
作者：
Brezinsek, S.
通讯作者：
Brezinsek, S.
影响因子：
3.3
作者：
P. Stangeby
通讯作者：
P. Stangeby
影响因子：
2.9
作者：
D. Rudakov;P. Stangeby;W. Wampler;J. Brooks;N. Brooks;J. Elder;A. Hassanein;A. Leonard;A. Mclean;R. Moyer;T. Sizyuk;J. Watkins;C. Wong
通讯作者：
D. Rudakov;P. Stangeby;W. Wampler;J. Brooks;N. Brooks;J. Elder;A. Hassanein;A. Leonard;A. Mclean;R. Moyer;T. Sizyuk;J. Watkins;C. Wong