Electrochemical formation of Sm–Ni alloy films in a molten LiCl–KCl–SmCl3 system
Electrochemical formation of Sm–Ni alloy films in a molten LiCl–KCl–SmCl3 system
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DOI：
10.1016/s0013-4686(01)00470-4
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发表时间：
2001-05
影响因子：
6.6
通讯作者：
T. Iida;T. Nohira;Y. Ito
中科院分区：
文献类型：
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作者：
T. Iida;T. Nohira;Y. Ito
研究了723 K下LiCl-KCl-SmCl 3（0.5mol%）体系中Sm-Ni合金的电化学形成过程。Mo电极的循环伏安图显示在1.60 V（相对于Li+/Li）下出现从Sm（III）到Sm（II）的还原波，但没有从Sm（II）到Sm金属的还原波。对于Ni电极，在比0.10 V更负的电位下观察到小的阴极电流，这表明Sm-Ni合金的形成。通过在0.10 V下72 h制备的样品的XRD分析证实SmNi 2相的形成。SmNi 2薄膜的厚度估计为约100 nm。采用阴极恒电流电解法，在50 mA cm− 2的电流密度下，在1 h的时间内获得了厚度约为20 μm的SmNi 2薄膜。由于Li金属在电解过程中共沉积，并且SmNi 2膜快速形成，因此这种电化学形成方法被称为“Li共沉积法”。通过阳极恒电位电解，SmNi 2薄膜转变为其它合金相。SmNi_5、SmNi_3和SmNi_2的形成电位分别为1.20、0.65和0.29 V。
The electrochemical formation of Sm–Ni alloys was investigated in a molten LiCl–KCl–SmCl3(0.5 mol%) system at 723 K. The cyclic voltammogram for a Mo electrode showed the reduction wave from Sm(III) to Sm(II) at 1.60 V (vs Li+/Li), but no reduction wave from Sm(II) to Sm metal. For a Ni electrode, small cathodic currents were observed at potentials more negative than 0.10 V, which indicated the formation of Sm–Ni alloy. The formation of an SmNi2phase was confirmed by XRD analysis of a sample prepared at 0.10 V for 72 h. The thickness of the SmNi2film was estimated to be approximately 100 nm. A much thicker SmNi2film (∼20 μm) was obtained by cathodic galvanostatic electrolysis at 50 mA cm−2in a time period as short as 1 h. Since Li metal was codepositing during the electrolysis and the SmNi2film was rapidly formed, this electrochemical formation method was termed the ‘Li codeposition method’. The formed SmNi2film was changed to other alloy phases by anodic potentiostatic electrolysis. The formation potentials of SmNi5, SmNi3and SmNi2were found to be 1.20, 0.65 and 0.29 V, respectively.