H.Ito, H.Miki, K.C.Namiki, N.Ito, H.Saitoh: "Dissociative excitation reaction of CH_3CN with the discharge flow of Ar : prediction of the [N]/([N]+[C]) ratio of hydrogenated amorphous carbon nitride films in the desiccated system"Japanese Journal of Appli
H.Ito, H.Miki, K.C.Namiki, N.Ito, H.Saitoh: "Dissociative excitation reaction of CH_3CN with the discharge flow of Ar : prediction of the [N]/([N]+[C]) ratio of hydrogenated amorphous carbon nitride films in the desiccated system"Japanese Journal of Appli
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H.Ito, H.Miki, K.C.Namiki, N.Ito, H.Saitoh：“CH_3CN 与 Ar 放电流量的解离激发反应：氢化物的 [N]/([N] [C]) 比率的预测
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