Simultaneous measurement of optical inhomogeneity and thickness variation by using dual-wavelength phase-shifting photorefractive holographic interferometry
Simultaneous measurement of optical inhomogeneity and thickness variation by using dual-wavelength phase-shifting photorefractive holographic interferometry
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DOI：
10.1016/j.optlastec.2013.08.019
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发表时间：
2014-03
影响因子：
5
通讯作者：
Jifeng Li;Y. R. Wang;Xiangfeng Meng;X. Yang;Q. Wang
中科院分区：
文献类型：
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作者：
Jifeng Li;Y. R. Wang;Xiangfeng Meng;X. Yang;Q. Wang
提出了一种用双波长移相光折变全息干涉仪同时测量厚度变化和光学不均匀性的方法。该方法对样品表面没有特殊要求，不需要在样品表面涂抹折射率匹配液等额外操作。利用光折变全息干涉术，自动补偿由干涉仪系统引起的波前变形。与其他方法相比，该方法更简单、更准确。计算机仿真和光学实验验证了该方法的可行性和可靠性。
A method to measure thickness variation and optical inhomogeneity simultaneously with a dual-wavelength phase-shifting photorefractive holographic interferometer is proposed. This method has no special requirements on the sample surfaces, and additional operations such as coating refractive index matching liquid on surfaces is not needed. With the help of photorefractive holographic interferometry, the wavefront distortion caused by the interferometer system is compensated automatically. Compared with other methods, this method is simpler and more accurate. Computer simulation and optical experiment have verified its feasibility and reliability.