Imaging of topologically protected elastic mode in silica 1D phononic crystal via photoelastic effect
Imaging of topologically protected elastic mode in silica 1D phononic crystal via photoelastic effect
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DOI：
10.23919/moc.2017.8244520
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发表时间：
2017-11
期刊：
影响因子：
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通讯作者：
Ingi Kim;S. Iwamoto;Y. Arakawa
中科院分区：
文献类型：
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作者：
Ingi Kim;S. Iwamoto;Y. Arakawa
利用光弹性成像技术测量了石英一维声子晶体（PnC）中拓扑保护弹性模的空间分布。实验证明了拓扑弹性模在拓扑带隙不同的两个连接的PnCs的界面处的强局部化。
We measure the spatial distribution of a topologically protected elastic modes in a silica 1D phononic crystal (PnC) by using the photoelasticity imaging technique. The strong localization of the topological elastic mode at the interface of two-joined PnCs with topologically distinct bandgaps is experimentally demonstrated.