Spray coating of PMMA for pattern transfer via electron beam lithography on surfaces with high topography
Spray coating of PMMA for pattern transfer via electron beam lithography on surfaces with high topography
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DOI：
10.1016/j.mee.2010.12.106
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发表时间：
2011-08-01
影响因子：
2.3
通讯作者：
Oesterschulze, E.
中科院分区：
文献类型：
--
作者：
Linden, J.;Thanner, Ch.;Oesterschulze, E.
在非平面表面喷涂聚甲基丙烯酸甲酯(PMMA)作为电子束抗蚀剂是一种可靠的制备厚度可调的硅片规模均匀抗蚀剂层的方法。在实验中，使用了带有超声喷嘴的商用喷涂层系统。评估了影响抗蚀剂层质量的参数，如超声波功率和分配体积，这些参数与4in硅片的一致性有关。通过在硅片上刻蚀8微米深沟槽的PMMA喷涂层，证明了喷涂PMMA对高表面图形转移的适用性。然后对PMMA进行电子束曝光，并通过剥离工艺在硅表面转移铬线图案。(C)2011爱思唯尔B.V.保留所有权利。
Spray coating of polymethylmethacrylate (PMMA) as electron beam resist on non planar surfaces is presented as a reliable technique for deposition of uniform resist layers with adjustable thickness at wafer scale. In the experiments a commercial spray coating system with an ultrasonic spray nozzle was used. Parameters which influence the quality of the resist layer with respect to uniformity across a 4 in Si wafer, such as ultrasonic power and dispensed volume, were evaluated. The suitability of spray coated PMMA for the pattern transfer on surfaces with high topography was proven by PMMA spray coating of 8 mu m deep trenches etched into Si wafers. The PMMA was then electron beam exposed and chromium line patterns were transferred on the Si surface via a lift-off process. (C) 2011 Elsevier B.V. All rights reserved.