Influence of Precursor Purge Time on the Performance of Zno Tfts Fabricated by Atomic Layer Deposition

Influence of Precursor Purge Time on the Performance of Zno Tfts Fabricated by Atomic Layer Deposition
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DOI:
10.2139/ssrn.4022316
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发表时间:
2022-03
期刊:
SSRN Electronic Journal
影响因子:
--
通讯作者:
Xue Chen;Jiaxian Wan;Liwei Ji;Juan Gao;Hao Wu;Chang Liu
Xue Chen;Jiaxian Wan;Liwei Ji;Juan Gao;Hao Wu;Chang Liu
中科院分区:
其他
文献类型:
--
作者:
Xue Chen;Jiaxian Wan;Liwei Ji;Juan Gao;Hao Wu;Chang Liu

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