Nonduplicate Polarization-Diversity 32 × 32 Silicon Photonics Switch Based on a SiN/Si Double-Layer Platform
Nonduplicate Polarization-Diversity 32 × 32 Silicon Photonics Switch Based on a SiN/Si Double-Layer Platform
复制标题
基于 SiN/Si 双层平台的非重复偏振分集 32 × 32 硅光子开关
DOI:
10.1109/jlt.2019.2934763
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发表时间:
2020
影响因子:
4.7
通讯作者:
K. Yamada
中科院分区:
文献类型:
--
作者:
Keijiro Suzuki;S. Namiki;H. Kawashima;K. Ikeda;R. Konoike;N. Yokoyama;M. Seki;M. Ohtsuka;S. Saitoh;S. Suda;H. Matsuura;K. Yamada
We fabricate and characterize a polarization-diversity 32 × 32 silicon photonics switch by newly introducing SiN overpass waveguides onto our nonduplicate polarization-diversity path-independent insertion-loss switch. The SiN overpass waveguides are used to simplify the optical paths with a uniform path length between the edge couplers and the switch matrix and significantly reduce the number of waveguide intersections. The switch chip is fabricated using a 300-mm silicon-on-insulator wafer pilot line. The fabricated switch comprises more than 7,600 components, making this the largest ever complementary-metal-oxide-semiconductor-based silicon photonics circuit. The switch chip is electrically and optically packaged and evaluated for a sampled port connection with 32 paths, with an average on-chip loss of ∼35 dB and an average polarization-dependent loss of 3.2 dB where 75% of the measured paths exhibit a loss of less than 3 dB. The differential group delay is measured to be 1.7 ps. The performance can be further improved by optimizing the device design.