Influence of acid slurries on surface quality of LBO crystal in fixed abrasive CMP

Influence of acid slurries on surface quality of LBO crystal in fixed abrasive CMP
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DOI:
10.1007/s00170-014-6662-1
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发表时间:
2015-04
期刊:
The International Journal of Advanced Manufacturing Technology
影响因子:
--
通讯作者:
Jun Li;Wenze Wang;Huimin Wang;Longlong Song;Zhanggui Hu;Y. Zhu;D. Zuo
Jun Li;Wenze Wang;Huimin Wang;Longlong Song;Zhanggui Hu;Y. Zhu;D. Zuo
中科院分区:
其他
文献类型:
--
作者:
Jun Li;Wenze Wang;Huimin Wang;Longlong Song;Zhanggui Hu;Y. Zhu;D. Zuo

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化学作用在固定磨料化学机械抛光(CMP)中起着重要作用,通常由浆料中的酸或碱调节剂决定。研究了酸性浆料对软脆难加工LBO (LiB3O5)晶体固定磨料CMP中表面质量和材料去除的影响。通过抛光实验筛选出pH为4.0的四种有机酸调节剂(乙酸、乳酸、柠檬酸、草酸)。此外,通过材料去除率(MRR)、表面形貌和表面粗糙度三个指标,将调节剂的pH值优化到最适合LBO晶体抛光的化学环境。结果表明,柠檬酸的抛光效果更好,表面粗糙度Sa(表面平均粗糙度)比其他两种材料低0.52 nm。此外,MRR随pH值的增加而降低。表面粗糙度先是随着pH值的增加而降低,达到最小值后达到最大值9.37 nm。pH为5.0的柠檬酸无磨料浆对LBO晶体的固定磨料CMP有效,MRR为366 nm/min,表面质量良好,表面粗糙度Sa为0.32 nm,表面损伤很小。
The chemical action, which is generally determined by acid or alkaline regulator in the slurry, plays an important role in fixed abrasive chemical mechanical polishing (CMP). Experiments were conducted to explore the influence of acid slurries on surface quality and material removal in fixed abrasive CMP of LBO (LiB3O5) crystal with soft and brittle, difficult-machining properties. Four organic acid regulators with pH 4.0 (acetic acid, lactic acid, citric acid, and oxalic acid) were screened by the polishing experiments. Further, pH value of the regulator was optimized to the most suitable chemical environment fit for polishing of LBO crystal using three indexes, i.e., material removal rate (MRR), surface topography, and surface roughness. The results indicated that citric acid leads to more robust polishing performance with surface roughness Sa (surface roughness average) 0.52 nm lower than the others. Additionally, MRR decreases with increasing pH value. Surface roughness initially decreases with increasing pH value, then it mutates to the maximum 9.37 nm after reach the minimum. The abrasive-free acid slurry with citric acid at pH 5.0 is effective for fixed abrasive CMP of LBO crystal, obtaining a MRR of 366 nm/min and fine surface quality with surface roughness Sa 0.32 nm with rather slight surface damage.