Use of process indices for simplification of the description of vapor deposition systems
Use of process indices for simplification of the description of vapor deposition systems
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DOI：
10.1016/j.mseb.2004.04.013
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发表时间：
2004-08-25
期刊：
影响因子：
--
通讯作者：
Komiyama, H
中科院分区：
文献类型：
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作者：
Kajikawa, Y;Noda, S;Komiyama, H
气相沉积是一个复杂的过程，包括气相、表面和固相现象。由于气相沉积过程中发生的化学和物理过程的复杂性，很难形成对气相沉积的全面、基本的了解，并控制这种系统以获得理想的结构和性能。为了克服这一困难，我们提出了一种简化这类系统的复杂描述的方法。一种简化方法是将复杂系统分成多个元素，并确定其中哪些是重要元素。我们称这种方法为缩写。删节方法只保留系统描述中的主导进程，而丢弃其他进程。可以通过使用过程指数来评估基本过程的相对重要性来实现缩略。我们通过连续薄膜的生长、初始沉积过程和多晶膜择优取向的形成的例子来描述这些工艺指标的制定和使用。在本文中，我们提出了一种将复杂的气相沉积过程表示为一组更简单的过程的方法。(C)2004爱思唯尔B.V.保留所有权利。
Vapor deposition is a complex process, including gas-phase, surface, and solid-phase phenomena. Because of the complexity of chemical and physical processes occurring in vapor deposition processes, it is difficult to form a comprehensive, fundamental understanding of vapor deposition and to control such systems for obtaining desirable structures and performance. To overcome this difficulty, we present a method for simplifying the complex description of such systems. One simplification method is to separate complex systems into multiple elements, and determine which of these are important elements. We call this method abridgement. The abridgement method retains only the dominant processes in a description of the system, and discards the others. Abridgement can be achieved by using process indices to evaluate the relative importance of the elementary processes. We describe the formulation and use of these process indices through examples of the growth of continuous films, initial deposition processes, and the formation of the preferred orientation of polycrystalline films. In this paper, we propose a method for representing complex vapor deposition processes as a set of simpler processes. (C) 2004 Elsevier B.V. All rights reserved.