Dual wavelength optical metrology using ptychography
Dual wavelength optical metrology using ptychography
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DOI：
10.1088/2040-8978/15/3/035702
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发表时间：
2013-01
影响因子：
2.1
通讯作者：
Daniel Claus;David Robinson;D. Chetwynd;Y. Shuo;William T. Pike;José J De J Toriz Garcia-José-J-De-J-Toriz-Garcia-2253794777;J. M. Rodenbur
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文献类型：
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作者：
Daniel Claus;David Robinson;D. Chetwynd;Y. Shuo;William T. Pike;José J De J Toriz Garcia-José-J-De-J-Toriz-Garcia-2253794777;J. M. Rodenbur
我们描述了一个实验实施的重叠关联光学计量，特别是地形测量，结合双波长的方法。这是第一次公开说明双波长方法在重叠关联成像或任何其他相位恢复方法中的应用，以便在反射模式下获得大范围尺度（从一小部分波长到数十个波长）的表面高度信息。此外，这里提出的工作是第一次报告的应用无透镜反射模式重叠。与其他光学形貌测量技术相比，重叠关联双波长方法的优点，特别是在实验程序和约束条件以及数据分析方面。我们表明，双波长重叠关联可以消除材料的特定相位变化，这对使用白色光轮廓测量的地形测量产生不利影响。
We describe an experimental implementation of ptychography to optical metrology, in particular topography measurement, in combination with the dual wavelength method. This is the first published account of the application of the dual wavelength method to ptychography or any other phase retrieval method in order to obtain surface height information over a wide range of scales, from small fractions of a wavelength up to many tens of wavelengths, in reflection mode. Moreover, the work presented here is the first report on the application of lensless reflection mode ptychography. Advantages of the ptychographic dual wavelength method are compared with other optical topography measurement techniques, especially with respect to the experimental procedures and constraints and the analysis of the data. We show that dual wavelength ptychography can remove material-specific phase changes which adversely affect topography measurements using white light profilometry.