Emissive Interface States in Organic Light-Emitting Diodes Based on Tris(8-hydroxyquinoline) Aluminum

Emissive Interface States in Organic Light-Emitting Diodes Based on Tris(8-hydroxyquinoline) Aluminum
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基于三(8-羟基喹啉)铝的有机发光二极管的发射界面态

DOI:
10.1143/jjap.47.464
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发表时间:
2008
影响因子:
1.5
通讯作者:
T. Morikawa
T. Morikawa
中科院分区:
物理与天体物理4区
文献类型:
--
作者:
Y. Nakano;K. Noda;H. Fujikawa;T. Morikawa

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用改进的深能级光谱法(DLOS)研究了氧化铟锡(ITO)/N,N '-二-1-萘基-N,N'-二苯基-1,1 '-联苯-4,4'-二胺(α-NPD)/三(8-羟基喹啉)铝(Alq 3)/LiF/Al有机电致发光器件(OLED)的发光界面态。空穴注入到OLED中后的DLOS显示,除了电荷载流子从α-NPD到Alq 3的带-带跃迁之外,在发射界面区域中位于Alq 3导带以下约1.77 eV处的离散陷阱能级。该显著的能级可以被激活作为电荷载流子的有效复合中心。此外,这种陷阱水平广泛分布到一个较低的能量与增加空穴注入率。因此,该能级可能归因于α-NPD/Alq 3发射界面处的本征陷阱态。因此,DLOS已被证明是一个强大的工具,在OLED的发射界面态的表征。
We have investigated emissive interface states in fabricated indium–tin-oxide (ITO)/N,N'-di-1-naphthyl-N,N'-diphenyl-1,1'-biphenyl-4,4'diamine (α-NPD)/tris(8-hydroxyquinoline) aluminum (Alq3)/LiF/Al organic light-emitting diodes (OLEDs) by modified deep-level optical spectroscopy (DLOS). DLOS after hole injection into the OLEDs revealed a discrete trap level located at ∼1.77 eV below the conduction band of Alq3 in the emissive interface region, in addition to the band-to-band transitions of charge carriers from α-NPD to Alq3. This pronounced level can be activated as an efficient recombination center of the charge carriers. Also, this trap level was extensively distributed to a lower energy with increasing hole injection rate. Therefore, this level is probably attributable to intrinsic trap states at the α-NPD/Alq3 emissive interface. Thus, DLOS has been proven to be a powerful tool for the characterization of emissive interface states in the OLEDs.
DOI: --
发表时间: 2021
期刊:
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作者:
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通讯作者: 安部省吾 ・ 山 元 和哉 ・ 門川淳一
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