Laboratory-based reflectometer using line spectra of an RF-induced gas-discharge lamp in 30- to 200-nm wavelength range
Laboratory-based reflectometer using line spectra of an RF-induced gas-discharge lamp in 30- to 200-nm wavelength range
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基于实验室的反射计,使用 30 至 200 nm 波长范围内射频感应气体放电灯的线光谱
DOI:
10.1117/1.jatis.8.1.017002
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发表时间:
2022-01
期刊:
影响因子:
--
通讯作者:
Wang Zhanshan
中科院分区:
文献类型:
--
作者:
Yu Yue;Ye Zeyi;Jiang Li;Yao Qianxia;Li Shuangying;Wu Jiali;Zhang Jinlong;Huang Qiushi;Xie Chun;Sokolov Andrey;Zhou Hongjun;Huo Tonglin;Li Wenbin;Wang Zhanshan
Abstract. A laboratory-based reflectometer designed for characterizing the reflectivity of optical coatings in 30- to 200-nm wavelength range was recently developed at IPOE. An RF-produced gas-discharge light source is applied to generate characteristic lines. The light source is mounted on a grazing incident monochromator with a 146-deg deviation angle between the incident and diffracted arms. By precisely adjusting the toroidal grating inside the monochromator chamber, monochromatic lights are acquired through the exit slit. A collimator mirror and two sets of collimation slits with 2 mm × 2 mm dimension are utilized for reducing the divergence of the beam incident on the sample. A high-precision six-axis translation stage, which allows a heavy sample with a maximum diameter of 100 mm, is used to control positions of the samples and the detector. A chopper disk used both for incident light intensity monitor and signal modulation is placed with an incidence angle of 70 deg relative to the incident light beam. The configuration, adjustment process, and test results of the reflectometer are presented in detail. The experimental reflectivity results for Al / LiF / MgF2 film obtained from our laboratory and BESSY-II Synchrotron as well as Hefei Synchrotron Light Source are given and compared for demonstrating the reliability of the system.
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DOI:
10.1063/1.1291819
发表时间:
2001-03
期刊:
--
影响因子:
--
作者:
R. Bosch;D. Eisert;M. Furst;R. M. Graves;L. Greenler;A. Hamilton;L. R. Hughey;R. Madden;P. Robl;P. Shaw;W. Trzeciak;R. Vest;D. Wahl
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DOI:
10.1117/12.2186275
发表时间:
2015-09
期刊:
--
影响因子:
--
作者:
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DOI:
10.1117/12.822585
发表时间:
2009-04
期刊:
--
影响因子:
--
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通讯作者:
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DOI:
10.1117/12.712853
发表时间:
2007-03
期刊:
--
影响因子:
--
作者:
U. Hinze;M. Fokoua;B. Chichkov
通讯作者:
U. Hinze;M. Fokoua;B. Chichkov
影响因子:
2.7
作者:
Cubitt, R;Fragneto, G
通讯作者:
Fragneto, G