Time-Resolved Electron Energy Distribution Function in Pulsed Surface Wave Plasma Generated by Ring-Slot Antenna
Time-Resolved Electron Energy Distribution Function in Pulsed Surface Wave Plasma Generated by Ring-Slot Antenna
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环缝天线产生的脉冲表面波等离子体中的时间分辨电子能量分布函数
DOI:
10.1143/jjap.42.l1188
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发表时间:
2003
期刊:
影响因子:
--
通讯作者:
Y. Okamoto
中科院分区:
文献类型:
--
作者:
Hiroyuki Murohashi;T. Okamoto;Y. Okamoto
Time-resolved probe measurements of the electron energy distribution function (EEDF) in a substrate (wafer) holder were performed in a pulse-modulated argon plasma of high density (>1011/cm3), low electron temperature (<2 eV) and excellent uniformity (±3% over 24 cm diameter). The plasma was produced by a time-modulated surface wave power with a ring-slot antenna. Microwave power (2.45 GHz, 1 kW max.) was modulated with a square wave pulse of 100 µs duration and 20–90% duty ratio. The temporal evolution of the EEDF was divided into two zones, namely, the zone where the microwave power is turned on (active plasma region: on-time) and that where the power is turned off (afterglow plasma region: off-time). In the first zone, the EEDF shows a fast evolution in which the number of high-energy electrons (high-energy tail of EEDF) increases with time. The second zone is characterized by a significant decrease in the number of high-energy electrons and an increasing EEDF that shifts to low energy values. These characteristics were compared with those of the continuously driven (CW) plasma.