Improved stoichiometry and misfit control in perovskite thin film formation at a critical fluence by pulsed laser deposition
Improved stoichiometry and misfit control in perovskite thin film formation at a critical fluence by pulsed laser deposition
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DOI：
10.1063/1.2146069
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发表时间：
2005-12-12
影响因子：
4
通讯作者：
Koinuma, H
中科院分区：
文献类型：
--
作者：
Ohnishi, T;Lippmaa, M;Koinuma, H
脉冲激光沉积（PLD）是一种生长高质量功能氧化物薄膜的好方法，因为技术简单，沉积可以从一种材料切换到另一种材料。然而，薄膜质量的可重复性通常很难实现，特别是当使用几个不同的PLD系统时。在这里，我们报告了我们所采取的步骤，以SrTiO3为例，通过可重复的方式使用PLD来生长几乎与体积相当的无缺陷薄膜。发现烧蚀激光通量对薄膜的晶格常数和缺陷结构有很强的影响。当激光辐照量或光束光斑面积不足时，观察到材料从烧蚀目标的非化学计量转移。(c) 2005年美国物理研究所。
Pulsed laser deposition (PLD) is a good method for growing high-quality functional oxide thin films because of the technical simplicity and the ease with which deposition can be switched from one material to another. However, the repeatability of film quality is often hard to achieve, especially when using several different PLD systems. Here we report the steps that we have taken to grow nearly bulk-equivalent defect-free thin films, with SrTiO3 as an example, by using PLD in a reproducible fashion. The ablation laser fluence was found to have a very strong effect on the lattice constant and defect structure of the films. Nonstoichiometric transfer of material from the ablation target was observed when either the laser fluence or the beam spot area was inadequate. (c) 2005 American Institute of Physics.