Retardation of sol-gel titanium oxide with imprinted grating structure
Retardation of sol-gel titanium oxide with imprinted grating structure
复制标题
溶胶-凝胶二氧化钛印迹光栅结构的延迟
DOI：
10.1117/1.oe.56.1.017108
复制
发表时间：
2017
影响因子：
1.3
通讯作者：
and T. Akiyama
中科院分区：
文献类型：
--
作者：
I. Yamada;Y. Ishihara;and T. Akiyama
我们采用印迹技术和溶胶-凝胶法制备了氧化钛光栅，并对其相延迟进行了评价。将氧化钛溶胶溶液在聚二甲基硅氧烷（聚二甲基硅氧烷；PDMS）模具上在150℃下印迹，得到了深度为75 nm、填充系数为0.3、周期为400 nm的氧化钛光栅。经相位延迟评价，在532nm波长处达到9.2°。
We fabricated a titanium oxide grating using an imprinting technique and a sol–gel method and evaluated phase retardation. A titanium oxide grating with 75 nm depth, fill factor of 0.3, and 400 nm period was obtained by imprinting a titanium oxide sol solution on a silicone (polydimethylsiloxane; PDMS) mold at 150°C. As a result of phase retardation evaluation, it reached 9.2 deg at the 532-nm wavelength.