Fabrication of Thick Metal Absorber With Overhanging Structure for TESs
Fabrication of Thick Metal Absorber With Overhanging Structure for TESs
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用于 TES 的悬垂结构厚金属吸收体的制造
DOI：
10.1109/tasc.2009.2019565
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发表时间：
2009
影响因子：
1.8
通讯作者：
Sang Jun Lee
中科院分区：
文献类型：
--
作者：
Young Hwa Lee;J. B. Bae;Il;Yong;Hwachol Lee;Kyoung Beom Lee;Min Kyu Lee;Sang Jun Lee
在这份报告中，我们描述了用于TES应用的具有悬垂结构的厚金属吸波材料的制造进展。首先，负性光刻胶被光刻，以确定蘑菇结构的茎。在光致抗蚀剂图案上溅射薄的Au种子层，以提供用于电镀的电接触。光致抗蚀剂的另一层被涂覆和图案化以形成结构的帽。然后在种子层的开口部分电沉积一层厚厚的Au。最后，在化学释放光致抗蚀剂和不需要的种子层后完成悬垂结构。这种在灵敏度参数α约为350的钛/金双层膜上制成的吸收体，目前正在研制中，用于测量高填充因子和高探测效率的X射线。
In this report, we describe progress in fabricating thick metal absorbers with an overhanging structure for TES applications. First, a negative photoresist is photo-lithographed in order to define the stem of the mushroom structure. A thin seed layer of Au is sputtered over the photoresist pattern to provide an electrical contact for electroplating. Another layer of the photoresist is coated and patterned to form the cap of the structure. A thick layer of Au is then electro-deposited on the open part of the seed layer. Finally, the overhanging structure is completed after chemically releasing the photoresist and the unwanted seed layer. This absorber made on a Ti/Au bilayer whose sensitivity parameter alpha is about 350, is currently being developed to measure X-rays with high filling factor and high detection efficiency.