High-Z material erosion and its control in DIII-D carbon divertor
High-Z material erosion and its control in DIII-D carbon divertor
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DIII-D炭过滤器高Z材料侵蚀及其控制
DOI：
10.1016/j.nme.2017.03.012
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发表时间：
2017-08
影响因子：
2.6
通讯作者：
E.A
中科院分区：
文献类型：
--
作者：
R. Ding;D.L. Rudakov;P.C. Stangeby;W.R. Wampler;T. Abrams;S. Brezinsek;A. Briesemeister;I. Bykov;V.S. Chan;C.P. Chrobak;J.D. Elder;H.Y. Guo;J. Guterl;A. Kirschner;C.J. Lasnier;A.W. Leonard;M.A. Makowski;A.G. McLean;P.B. Snyder;D.M. Thomas;D. Tskhakaya;E.A
由于高Z材料将可能用作未来聚变装置中的面向等离子体的部件（PFC），因此高Z材料的侵蚀是高功率长脉冲操作的关键问题。高Z材料的侵蚀和再沉积已被研究使用钨和钼涂层的样品暴露在诊断良好的DIII-D偏滤器等离子体放电。通过耦合专用的实验和建模，使用3D Monte Carlo代码ERO，鞘层电位和背景碳杂质在确定高Z材料侵蚀的作用。已研究了通过建模建议的不同方法来控制DIII-D实验中的高Z材料侵蚀。Mo和W的腐蚀被发现强烈抑制局部注入甲烷和氘气。由13 CH 4局部注入引起的13 C沉积也提供了由于E × B漂移和交叉场扩散引起的径向输运的信息。最后，D2气体喷吹被发现会引起局部等离子体扰动，抑制W的侵蚀，因为在较低的等离子体温度和较高的碳浓度的混合表面层中的W的有效溅射产率较低。
As High-Z materials will likely be used as plasma-facing components (PFCs) in future fusion devices, the erosion of high-Z materials is a key issue for high-power, long pulse operation. High-Z material erosion and redeposition have been studied using tungsten and molybdenum coated samples exposed in well-diagnosed DIII-D divertor plasma discharges. By coupling dedicated experiments and modelling using the 3D Monte Carlo code ERO, the roles of sheath potential and background carbon impurities in determining high-Z material erosion are identified. Different methods suggested by modelling have been investigated to control high-Z material erosion in DIII-D experiments. The erosion of Mo and W is found to be strongly suppressed by local injection of methane and deuterium gases. The13C deposition resulting from local13CH4injection also provides information on radial transport due toE×Bdrifts and cross field diffusion. Finally, D2gas puffing is found to cause local plasma perturbation, suppressing W erosion because of the lower effective sputtering yield of W at lower plasma temperature and for higher carbon concentration in the mixed surface layer.
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影响因子：
3.1
作者：
W. Wampler;P. Stangeby;J. Watkins;D. Buchenauer;D. Rudakov;C. Wong
通讯作者：
W. Wampler;P. Stangeby;J. Watkins;D. Buchenauer;D. Rudakov;C. Wong
影响因子：
3.1
作者：
Brezinsek, S.
通讯作者：
Brezinsek, S.
影响因子：
3.3
作者：
P. Stangeby
通讯作者：
P. Stangeby
影响因子：
2.9
作者：
D. Rudakov;P. Stangeby;W. Wampler;J. Brooks;N. Brooks;J. Elder;A. Hassanein;A. Leonard;A. Mclean;R. Moyer;T. Sizyuk;J. Watkins;C. Wong
通讯作者：
D. Rudakov;P. Stangeby;W. Wampler;J. Brooks;N. Brooks;J. Elder;A. Hassanein;A. Leonard;A. Mclean;R. Moyer;T. Sizyuk;J. Watkins;C. Wong
影响因子：
3.3
作者：
A. Kirschner;V. Philipps;J. Winter;U. Kögler
通讯作者：
A. Kirschner;V. Philipps;J. Winter;U. Kögler