Performance of the KHI FEL device at FEL-SUT
Performance of the KHI FEL device at FEL-SUT
复制标题
FEL-SUT 上 KHI FEL 设备的性能
DOI：
10.1016/s0168-9002(02)00330-3
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发表时间：
2002
影响因子：
1.4
通讯作者：
H. Kuroda
中科院分区：
文献类型：
--
作者：
M. Yokoyama;Oda Fumihiko;K. Nomaru;H. Koike;M. Sobajima;H. Miura;Kawai Masayuki;H. Kuroda
使用 KHI（川崎重工业株式会社）FEL 装置实现了波长 4-16μm 内饱和功率的 FEL 激光。通过使用LaB6阴极代替分配器阴极作为OCS射频枪的阴极，提高了电子束的宏观脉冲长度。这一改进产生了宏脉冲长度为 0.5–1.5μs 的饱和 FEL 功率。 FEL 能量为 2–40mJ。测得的 FEL 输出功率与考虑 Piovella 理论的值一致。
FEL lasing with the saturated power in the wavelength of 4–16μm was achieved by using the KHI (Kawasaki Heavy Industries, Ltd.) FEL device. The macro-pulse length of the electron beam was improved by using the LaB6cathode instead of the dispenser cathode as a cathode of the OCS RF-gun. The improvement yielded the saturated FEL power with the macro-pulse length of 0.5–1.5μs. The FEL energy was 2–40mJ. The measured FEL output powers were in agreement with the values which were taken into account Piovella’s theory.