Mechanical properties of a‐Si:H films studied by Brillouin scattering and nanoindenter
Mechanical properties of a‐Si:H films studied by Brillouin scattering and nanoindenter
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DOI：
10.1063/1.345064
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发表时间：
1990-06
影响因子：
3.2
通讯作者：
Xin Jiang;B. Goranchev;K. Schmidt;P. Grünberg;K. Reichelt
中科院分区：
文献类型：
--
作者：
Xin Jiang;B. Goranchev;K. Schmidt;P. Grünberg;K. Reichelt
A series of a‐Si:H films has been prepared by rf sputtering in a H2‐Ar gas mixture. To obtain films with different hydrogen content the hydrogen portion of the gas mixture was changed from 0% to 20%. The shear modulus μ was then measured by the frequency of the surface phonon (Rayleigh wave). The stiffness S and the ultramicrohardness H were measured by using a nanoindenter. From the shear modulus μ and the stiffness S, the Young’s modulus E and Poisson’s ratio ν were calculated. The intrinsic mechanical stress was measured by the bending‐beam method. With increasing hydrogen content of the films, the decrease of Young’s modulus, microhardness, and internal stress are observed.
