Ultrafast double pulses ablation of Cr film on glass
Ultrafast double pulses ablation of Cr film on glass
复制标题
DOI：
10.1016/j.optcom.2008.05.036
复制
发表时间：
2008-09
影响因子：
2.4
通讯作者：
Zehua Han;Changhe Zhou;E. Dai;Jin Xie
中科院分区：
文献类型：
--
作者：
Zehua Han;Changhe Zhou;E. Dai;Jin Xie
采用双脉冲法研究了Cr膜的超快激光烧蚀。实验结果表明，当双脉冲均小于阈值时，存在时间消融窗口效应。当双脉冲间隔在400ps量级时，Cr膜就会发生烧蚀。当双脉冲间隔超过400ps数量级时，Cr膜不会发生烧蚀，同时Cr膜表面的反射率急剧上升。将双温度模型发展为双脉冲的形式来解释实验现象。超快双脉冲烧蚀后，在Cr膜表面形成微凹凸结构。在双脉冲延迟1 ~ 10ps之间，它们的高度有明显的下降，这与电子-声子耦合过程有关。这些结果有助于理解超快激光烧蚀金属薄膜的动力学过程。
Ultrafast lasers ablation of Cr film was investigated by using double-pulse method. Experimental results show that there exists a temporal ablation window effect with each of the double pulses adjusted just smaller than the threshold. When the delay between the double pulses is within the order of 400ps, the ablation of Cr film could happen. When the delay between the double pulses is beyond the order of 400ps, the ablation of Cr film would not happen, and the reflectivity from the surface of the Cr film shows a sharp rise at the same time. The two-temperature model was developed into the form of double pulses to explain the experimental phenomena. Furthermore, microbump structures were formed on the surface of Cr film after ablation by ultrafast double pulses. Their heights exhibit an obvious drop between 1 and 10ps double pulses delay, which is involved with the electron–phonon coupling process according to the numerical simulation. These results should be helpful for understanding the dynamic processes during ultrafast lasers ablation of metal films.