Structure of the Bi/Si(111) Surface by Field-Ion Scanning Tunneling Microscopy
Structure of the Bi/Si(111) Surface by Field-Ion Scanning Tunneling Microscopy
复制标题
通过场离子扫描隧道显微镜观察 Bi/Si(111) 表面的结构
DOI：
10.1143/jjap.32.1416
复制
发表时间：
1993
影响因子：
1.5
通讯作者：
Toshio Sakurai Toshio Sakurai
中科院分区：
文献类型：
--
作者：
Chan Park;R. Z. Bakhtizin;Tomihiro Hashizume Tomihiro Hashizume;Toshio Sakurai Toshio Sakurai
LEED和FI-STM的结合被用来表征Bi/Si（111）系统。首次利用STM对Si（111）表面形成的√3x√3结构的两种不同相进行了成像，并研究了其作为覆盖度的函数。Bi原子的三聚体在1ml时被清楚地分解，而单Bi原子的吸附在1/3 ML时被记录。这些结构的原子几何形状和两相的发展作为覆盖的函数进行了讨论。
A combination of LEED and FI-STM has been used to characterize the Bi/Si(111) system. Two distinct phases of the √3×√3 structure formed on the Si(111) surface are imaged for the first time by STM and are studied as a function of coverage. Trimers of Bi atoms are clearly resolved at 1 ML whereas single Bi atom adsorption are documented at 1/3 ML. The atomic geometry of these structures and the development of two phases as a function of coverage are discussed.