Effect of substrate temperature and oxygen partial pressure on microstructure and optical properties of pulsed laser deposited yttrium oxide thin films
Effect of substrate temperature and oxygen partial pressure on microstructure and optical properties of pulsed laser deposited yttrium oxide thin films
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DOI：
10.1016/j.apsusc.2011.03.156
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发表时间：
2011-06
影响因子：
6.7
通讯作者：
M. Mishra;P. Kuppusami;T. Sairam;Akash Singh;E. Mohandas
中科院分区：
文献类型：
--
作者：
M. Mishra;P. Kuppusami;T. Sairam;Akash Singh;E. Mohandas
在不同的衬底温度和氧分压条件下，采用脉冲激光沉积技术在Si（11 11）和石英衬底上沉积氧化钇薄膜。XRD分析表明，随着衬底温度从300 ~ 873 K升高，氧化钇薄膜的晶粒尺寸增大。而在恒定的衬底温度和可变的氧分压条件下沉积的薄膜对晶粒尺寸的影响则相反。紫外-可见光谱法测定的带隙能值高于报道的体值。
Yttrium oxide thin films were deposited on Si (1 1 1) and quartz substrates by pulsed laser deposition technique at different substrate temperature and oxygen partial pressure. XRD analysis shows that crystallite size of the yttrium oxide thin films increases as the substrate temperature increases from 300 to 873 K. However the films deposited at constant substrate temperature with variable oxygen partial pressure show opposite effect on the crystallite size. Band gap energies determined from UV–visible spectroscopy indicated higher values than that of the reported bulk value.