PHOTON-INDUCED PHONON EXCITATION PROCESS AS NONEQUILLIBRIUM SUBSURACE MODIFICATION OF ION-IMPLANTED NANO-SCALE LAYER FOR ULTRA-SHALLOW JUNCTION FORMATION
PHOTON-INDUCED PHONON EXCITATION PROCESS AS NONEQUILLIBRIUM SUBSURACE MODIFICATION OF ION-IMPLANTED NANO-SCALE LAYER FOR ULTRA-SHALLOW JUNCTION FORMATION
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光子诱导声子激发过程作为离子注入纳米级层的非平衡亚表面改性以形成超浅结
DOI:
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发表时间:
2003
期刊:
影响因子:
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通讯作者:
Y.Setsuhara
中科院分区:
文献类型:
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作者:
Y.Setsuhara;A.Ebe;Y.Setsuhara