Deep reactive ion etching of silicon moulds for the fabrication of diamond x-ray focusing lenses

Deep reactive ion etching of silicon moulds for the fabrication of diamond x-ray focusing lenses
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DOI:
10.1088/0960-1317/23/12/125018
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发表时间:
2013-11
影响因子:
2.3
通讯作者:
A. Malik;O. Fox;L. Alianelli;A. Korsunsky;R. Stevens;I. Loader;M. Wilson;I. Pape;K. Sawhney;P. May
A. Malik;O. Fox;L. Alianelli;A. Korsunsky;R. Stevens;I. Loader;M. Wilson;I. Pape;K. Sawhney;P. May
中科院分区:
工程技术4区
文献类型:
--
作者:
A. Malik;O. Fox;L. Alianelli;A. Korsunsky;R. Stevens;I. Loader;M. Wilson;I. Pape;K. Sawhney;P. May

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