The effect of gamma-ray irradiation on the adsorption properties and chemical stability of AMP/SiO2 towards Cs(I) in HNO3 solution
The effect of gamma-ray irradiation on the adsorption properties and chemical stability of AMP/SiO2 towards Cs(I) in HNO3 solution
复制标题
γ射线辐照对HNO3溶液中AMP/SiO2对Cs(I)吸附性能和化学稳定性的影响
DOI:
10.1007/s10967-016-4862-x
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发表时间:
2016
影响因子:
1.6
通讯作者:
Wei Yuezhou
中科院分区:
文献类型:
--
作者:
Zhang Xiaoxia;Wu Yan;Chen Baocai;Wei Yuezhou
Silica based ammonium molybdophosphate (AMP/SiO2) adsorbent was used to remove Cs(I) from HNO3solution. The adsorbent with different absorbed dose (0–300 kGy) was characteristed by X-ray power diffraction. The adsorption data against different γ-ray absorbed doses were analyzed by the Langmuir isotherm. The adsorption capacity decreased slightly from 23.22 to 22.37 mg/g with the increase of the absorbed dose. The breakthrough properties of Cs(I) were conducted using column packed with AMP/SiO2before and after irradiation. The chemical stability of AMP/SiO2at 300 kGy absorbed dose in 3 mol/L (M) HNO3was excellent.