Possible Emittance Increase through Filamentation Due to Space Charge in Continuous Beams

Possible Emittance Increase through Filamentation Due to Space Charge in Continuous Beams
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由于连续光束中的空间电荷,可能通过丝状结构增加发射率

DOI:
10.1109/tns.1971.4326292
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发表时间:
1971
期刊:
影响因子:
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通讯作者:
P. Lapostolle
P. Lapostolle
中科院分区:
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文献类型:
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作者:
P. Lapostolle

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除了卡钦斯基和弗拉基米尔斯基(K.V.)所描述的分布之外,对空间电荷条件下束流中可能发生的振荡的研究已经扩展到其他分布。在1959年。只要将轴线和发射值替换为适用于任何类型分布的均方根表达式,就可以写出与他们所建立的方程类似的两组方程。在非KV分布的情况下,这些集合的比较给出了将均方根发射率与取决于束内电荷分布的校正项联系起来的微分方程式。这些方程可以用来解释在光滑聚焦通道中的失配或在AG聚焦系统中的匹配光束下观察到的一些均方根发射度增加。
The study of oscillations which can take place in a beam under space charge conditions has been extended to other distributions than the one described by Kapchinsky and Vladimirsky (K. V.) in 1959. Two sets of equations similar to the ones they established can be written provided axis and emittance values are replaced by rms expressions applicable to any type of distribution. In case of a non K. V. distribution, the comparison of these sets gives differential equations relating the rms emittances to correcting terms which depend on the charge distribution inside the beam. Such equations can be used to interpret some rms emittance increases observed either with a mismatch in a smooth focusing channel or with a matched beam in an AG focusing system.