High-resolution atomic channeling using. velocity-selected atomic beam
High-resolution atomic channeling using. velocity-selected atomic beam
复制标题
使用高分辨率原子通道。
DOI：
10.1007/s003400100736
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发表时间：
2001
期刊：
影响因子：
--
通讯作者：
M. Watanabe
中科院分区：
文献类型：
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作者：
R. Ohmukai;S. Urabe;M. Watanabe
使用速度受控原子的高分辨率原子沟道可能能够克服传统原子光刻的精度限制。我们首次从实验上阐明了沟道区原子图案的线宽和对比度与原子源速度分布的依赖关系。采用一维磁光阱制备的热或速度选择原子束作为原子源。我们通过测量原子吸收光谱在强驻波光场中的频移来研究沟道效应。结果表明，随着速度分布的减小，原子谱线的线宽变窄，原子谱线的对比度提高。当原子源的速度扩散几乎为50 m/s，即热束的1/6时，产生了估计线宽为57 nm的原子图案。
High-resolution atomic channeling using velocity-controlled atoms may be able to overcome precision limitations of the conventional atom lithography. We have experimentally clarified the dependence of line width and contrast of atomic patterns in the channeling region on the velocity spread of the atomic source for the first time. Thermal or velocity-selected atomic beams prepared with a one-dimensional magneto-optical trap were employed as the atomic sources. We investigated the channeling characteristics by measuring the frequency shifts of the atomic absorption spectra in an intense standing wave light field. As a result, we can show that narrower line width and higher contrast atomic patterns are obtained as the velocity spread becomes narrower. An atomic pattern with an estimated line width of 57 nm was generated when the velocity spread of the atomic source was almost 50 m/s, that is, 1/6 that of the thermal beam.