Rapid Growth of Hard and Compact Layers of Stoichiometric ZrN by DC Reactive Magnetron Sputtering Pulsed at Low Frequency
Rapid Growth of Hard and Compact Layers of Stoichiometric ZrN by DC Reactive Magnetron Sputtering Pulsed at Low Frequency
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DOI：
10.1002/1527-2648(200012)2:12
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发表时间：
2000-12
影响因子：
3.6
通讯作者：
J. Dauchot;R. Gouttebaron;M. Wautelet;M. Hecq
中科院分区：
文献类型：
--
作者：
J. Dauchot;R. Gouttebaron;M. Wautelet;M. Hecq
