Photoresist-derived carbon for microelectromechanical systems and electrochemical applications
Photoresist-derived carbon for microelectromechanical systems and electrochemical applications
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DOI：
10.1149/1.1393188
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发表时间：
2000-01-01
影响因子：
3.9
通讯作者：
Madou, M
中科院分区：
文献类型：
--
作者：
Ranganathan, S;McCreery, R;Madou, M
在不同的温度和不同的环境气氛下热解的光刻电阻可以作为一种碳质材料用于微机电系统。在600 ~ 1100℃的温度下，将光刻胶热解制备成碳膜，并用轮廓分析法、热重分析法、四点探针法、扫描电镜、透射电镜、原子力显微镜等分析技术对碳膜进行了表征。x射线光电子能谱（XPS）和拉曼光谱。此外，对碳膜电极进行了循环伏安法，并将碳膜与玻璃碳（GC）的电化学行为进行了比较。Fe(CN)(6)（3-/4-）和Ru(NH3)(6)（3+/2+）氧化还原体系的电子传递速率常数随热处理温度的升高而升高，并在1100℃下接近GC上观察到的值。热解膜的电容和背景电流较低，约为GC上观察到的四分之一。XPS测定的氧/碳原子比较低（1100℃预处理时接近1%），与相同条件下处理的气相色谱相比，暴露在空气中增加的速度更慢。光刻胶的热解使碳电极器件的光刻制造成为可能，并且似乎也产生了具有光滑表面和不同寻常的表面化学性质的碳膜。(C) 2000电化学学会。s0013 - 4651(99) 02-055-8。版权所有。
Photopatterned resists pyrolyzed at different temperatures and different ambient atmospheres can be used as a carbonaceous material for microelectromechanical systems. Carbon films were prepared by pyrolysis of photoresists at temperatures ranging from 600 to 1100 degrees C. The carbon films were characterized by several analytical techniques, viz., profilometry, thermogravimetric analysis, four-point probe measurements, scanning electron microscopy, transmission electron microscopy, atomic force microscopy. X-ray photoelectron spectroscopy (XPS), and Raman spectroscopy. In addition, cyclic voltammetry was performed on the carbon film electrodes, and the carbon films were compared to glassy carbon (GC) for their electrochemical behavior. Electron-transfer rate constants for the benchmark Fe(CN)(6)(3-/4-) and Ru(NH3)(6)(3+/2+) redox systems increased with increasing heat-treatment temperature, and approached those observed on GC following treatment at 1100 degrees C. The pyrolyzed films have low capacitance and background current, approximately one-fourth of that observed on GC. The oxygen/carbon atomic ratio determined from XPS was low (similar to 1% for 1100 degrees C pretreatment), and increased more slowly upon exposure to air than that for GC treated under identical conditions. Pyrolysis of photoresist Alms permits photolithographic fabrication of carbon electrode devices, and also appears to yield a carbon film with a smooth surface and unusual surface chemistry. (C) 2000 The Electrochemical Society. S0013-4651(99)02-055-8. All rights reserved.