Additive Nano-Lithography with Focused Soft X-rays: Basics, Challenges, and Opportunities
Additive Nano-Lithography with Focused Soft X-rays: Basics, Challenges, and Opportunities
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DOI：
10.3390/mi10120834
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发表时间：
2019-11
期刊：
影响因子：
3.4
通讯作者：
A. Späth
中科院分区：
文献类型：
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作者：
A. Späth
聚焦软X射线束诱导沉积（FXBID）是一种利用金属有机前体气体直接写入金属纳米结构的纳米加工新技术。它结合了聚焦电子束诱导加工 (FEBIP) 和 X 射线光刻 (XRL) 的既定概念。本装置基于配备气流池的扫描透射 X 射线显微镜 (STXM)，以向预期沉积区域提供金属有机前体分子。以全面的形式介绍了与 FXBID 开发相关的 X 射线显微镜仪器和 X 射线辐射化学的基础知识。对最近发表的 FXBID 纳米光刻初步实验的概念验证研究进行了回顾，以概述纳米制造性能的当前进展和拟议进展。讨论了基于电子/离子的竞争技术的 FXBID 的潜在应用和优势。
Focused soft X-ray beam induced deposition (FXBID) is a novel technique for direct-write nanofabrication of metallic nanostructures from metal organic precursor gases. It combines the established concepts of focused electron beam induced processing (FEBIP) and X-ray lithography (XRL). The present setup is based on a scanning transmission X-ray microscope (STXM) equipped with a gas flow cell to provide metal organic precursor molecules towards the intended deposition zone. Fundamentals of X-ray microscopy instrumentation and X-ray radiation chemistry relevant for FXBID development are presented in a comprehensive form. Recently published proof-of-concept studies on initial experiments on FXBID nanolithography are reviewed for an overview on current progress and proposed advances of nanofabrication performance. Potential applications and advantages of FXBID are discussed with respect to competing electron/ion based techniques.