Electrical and optical inhomogeneity in N-face GaN grown by hydride vapor phase epitaxy
Electrical and optical inhomogeneity in N-face GaN grown by hydride vapor phase epitaxy
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DOI:
10.1016/j.jcrysgro.2013.03.018
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发表时间:
2013-06
影响因子:
1.8
通讯作者:
X. Su;Kun Xu;Guoqiang Ren;Jin-yun Wang;Yujin Xu;Xionghui Zeng;Junya Zhang;D. Cai;Tianming Zhou;Zongshun Liu;Huali Yang
中科院分区:
文献类型:
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作者:
X. Su;Kun Xu;Guoqiang Ren;Jin-yun Wang;Yujin Xu;Xionghui Zeng;Junya Zhang;D. Cai;Tianming Zhou;Zongshun Liu;Huali Yang